• Advanced Microscopy
    • 3D True Color Optical Imaging
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    • Acoustic Microscopy
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    • Confocal Laser Scanning Microscopy
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    • Electron Microscopy       
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    • Infrared Microscopy

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    • Live Cell Imaging

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    • Industrial Optical Microscopy

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    • Scanning Probe Microscopy

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  • Focused Ion Beam (FIB)
    • Single Beam System
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    • Double Beam System

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    • Triple Beam System

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    • Cross Beam System

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    • Neon

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  • Microanalysis
    • Electron Probe Micro-Analyzer (EPMA)

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    • Energy Dispersive Microanalysis System (EDS)

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    • Wavelength Dispersive Microanalysis System (WDS)

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    • Electron Backscattered Diffraction (EBSD)

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  • Surface Metrology
    • 3D True Colour Optical Profiler

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    • Stylus Profiler

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    • Non-contact optical Profiler

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  • Semiconductor Metrology
    • Industrial Optical Microscopy

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    • Infared Microscopy

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    • Defect Inspection, Review and ADC

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    • Macro and Micro Defect Review Tool

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  • Surface Sciences
    • Sector SIMS

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    • Time OF Flight SIMS

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    • Quadrapole SIMS

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    • LEIS

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    • LEXES

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    • Tomographic Atom Probe

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  • UHV Thin Film Deposition
    • Physical Vapor Deposition (PVD)

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    • Molecular Beam Epitaxy System (MBE)

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  • Vacuum Solution
  • Workstations
    • Imaging Workstation

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    • Fluorescence Workstation

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    • Live Cell Imaging Workstation

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    • Material Workstation

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  • Sample Preparations
    • Drying

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    • Coating

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    • Cryo transfer

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    • Cryo-fixation

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    • Freeze-etch & -fracture System

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    • Freeze Substitution System

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    • Glass Knife Maker & Diamond Knives

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    • Ultramicrotome

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    • Ultramicrotome With Cryo

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    • Microtome

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    • Automatic Tissue Processor

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    • Argon Ion Milling System

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Surface Metrology
Non-contact optical Profiler

Contact & Support
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Interferometer

The Xi-100 is designed for the researcher who is interested in getting fast, repeatable data from an instrument that is unencumbered by unnecessary levels of complication. The Xi-100 uses phase-shifting interferometric technology combined with an optical microscope to provide a non-contact 3D method of measuring the roughness of surfaces.

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Xi-100 Features Include:

  • Precise, high-resolution, non-contact 3D profiler

  • 'Point and shoot' operation. The only instrument adjustments for capturing measurements are sample position and focus, allowing for rapid and easy imaging.

  • Accurate and repeatable data on smooth or rough surfaces

  • Measure smooth surfaces at the nanometer level - 0.2 nm (smooth mode) Vertical Resolution

  • Full featured 3D analysis software comes standard with the Xi-100 and operates with Windows®, Intel Processor and TFT Flat Panel Monitor. Analysis package provides surface roughness, waviness, step height, algorithms, and calculation tools

  • Xi-100 can quickly and accurately measure smooth surfaces at the nanometer level. Its design makes it easy to measure a variety of sample types: opaque, transparent, smooth or rough with a non-contact interferometric method (requires minimum sample reflectivity of 2% @ 550 nm).

  • XY Stage Movement of 100 x 100 nm

 

 

     
   

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