• Advanced Microscopy
    • 3D True Color Optical Imaging
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    • Acoustic Microscopy
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    • Confocal Laser Scanning Microscopy
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    • Electron Microscopy       
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    • Infrared Microscopy

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    • Live Cell Imaging

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    • Industrial Optical Microscopy

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    • Scanning Probe Microscopy

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  • Focused Ion Beam (FIB)
    • Single Beam System
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    • Double Beam System

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    • Triple Beam System

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    • Cross Beam System

    • ---------------------------------------------------------------------------------------------------------------------------------
    • Neon

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  • Microanalysis
    • Electron Probe Micro-Analyzer (EPMA)

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    • Energy Dispersive Microanalysis System (EDS)

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    • Wavelength Dispersive Microanalysis System (WDS)

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    • Electron Backscattered Diffraction (EBSD)

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  • Surface Metrology
    • 3D True Colour Optical Profiler

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    • Stylus Profiler

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    • Non-contact optical Profiler

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  • Semiconductor Metrology
    • Industrial Optical Microscopy

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    • Infared Microscopy

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    • Defect Inspection, Review and ADC

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    • Macro and Micro Defect Review Tool

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  • Surface Sciences
    • Sector SIMS

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    • Time OF Flight SIMS

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    • Quadrapole SIMS

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    • LEIS

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    • LEXES

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    • Tomographic Atom Probe

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  • UHV Thin Film Deposition
    • Physical Vapor Deposition (PVD)

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    • Molecular Beam Epitaxy System (MBE)

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  • Vacuum Solution
  • Workstations
    • Imaging Workstation

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    • Fluorescence Workstation

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    • Live Cell Imaging Workstation

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    • Material Workstation

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  • Sample Preparations
    • Drying

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    • Coating

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    • Cryo transfer

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    • Cryo-fixation

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    • Freeze-etch & -fracture System

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    • Freeze Substitution System

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    • Glass Knife Maker & Diamond Knives

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    • Ultramicrotome

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    • Ultramicrotome With Cryo

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    • Microtome

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    • Automatic Tissue Processor

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    • Argon Ion Milling System

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Semiconductor Metrology
Defect Inspection, Review and ADC

Contact & Support
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Vistec SpotCheck
 
Overview

SpotCheck is a software for automatic site inspection on semiconductor wafers. It can be used for reticle inspection, fuse inspection, bondpad inspection and for overlay check. Freely programmable spots (areas) are visited on a wafer.

Multiple images are used to detect nonsystematic deviations and irregularities. A "golden image" is applied to recognize systematic defects. Both methods are combinable. The user just tells the system which dies are to be inspected, presses the start button and within a minimum of time a multi format result file is fully automatically created and can be handed over to any conventional Data Management System.

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Key Features

  • High Throughput with operator independent results for your defect management

  • Replaces expensive overlay metrology tools for non critical layers

  • Minimum time for recipe setup-simple operation based upon automated parameter setup

  • Allows fast and reliable reticle check

  • Minimum cost of ownership - in comparison with operator based solutions

  • Easy operation - requires less engineering time

  • Platform independent - retrofittable to existing INS3000, INS3300 and LDS 3000 systems

  • Fully integrated in Viscon NT - only minimum additional training required

  • Combinable with ADC - fully automated detection and classification

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Detailed Description

  •  SpotCheck software is an optimum upgrade for all Vistec 200 mm inspection stations as well as a must for each newly installed 300 mm and macro inspection stations. Besides a very high throughput the SpotCheck software provides extremely easy operation with highly accurate and repeatable detection results and minimum cost of ownership.
    As it is fully integrated into the Viscon NT software, the user needs hardly any additional training. The typical time for a recipe setup is below 5 minutes.
     

  • With SpotCheck software, both systematic and nonsystematic defects are detected. Systematic defects are defects that are present in every Die/SAW of the wafer and are detected using a golden image generated from a non-defective wafer. Examples of systematic defects that can be detected are a wrong reticle, or an overlay shift.
    Non systematic defects are defects randomly distributed on a wafer such as particles or scratches. These defects can be detected using either a golden image or die-to-die comparison. Typical defects detectable are residual resists, extra pattern, particles, micro-masking, probe mark position errors, etc. In combination with the field-proven Vistec ADC NT (Automatic Defect Classification) the review station can classify defects in-line without any additional wafer handling.
    In a special mode, SpotCheck allows for automatic and very fast overlay check and is therefore able to replace expensive dedicated overlay metrology systems for many layers.

     

 
     
   

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