*** Focused ion Beam ***

Advanced Microscopy
- 3D True Color Optical Imaging
- Acoustic Microscopy
- Confocal Laser Scanning Microscopy
- Electron Microscopy
- Infrared Microscopy
- Live Cell Imaging
- Industrial Optical Microscopy
- Scanning Probe Microscopy
Focused Ion Beam (FIB)
- Single Beam System
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- Double Beam System
- Triple Beam System
- Cross Beam System
- Neon
Microanalysis
- Electron Probe Micro-Analyzer (EPMA)
- Energy Dispersive Microanalysis System (EDS)
- Wavelength Dispersive Microanalysis System (WDS)
- Electron Backscattered Diffraction (EBSD)
Surface Metrology
- 3D True Colour Optical Profiler
- Stylus Profiler
- Non-contact optical Profiler
Semiconductor Metrology
- Industrial Optical Microscopy
- Infared Microscopy
- Defect Inspection, Review and ADC
- Macro and Micro Defect Review Tool
Surface Sciences
- Sector SIMS
- Time OF Flight SIMS
- Quadrapole SIMS
- LEIS
- LEXES
- Tomographic Atom Probe
UHV Thin Film Deposition
- Physical Vapor Deposition (PVD)
- Molecular Beam Epitaxy System (MBE)
Vacuum Solution
Workstations
- Imaging Workstation
- Fluorescence Workstation
- Live Cell Imaging Workstation
- Material Workstation
Sample Preparations
- Drying
- Coating
- Cryo transfer
- Cryo-fixation
- Freeze-etch & -fracture System
- Freeze Substitution System
- Glass Knife Maker & Diamond Knives
- Ultramicrotome
- Ultramicrotome With Cryo
- Microtome
- Automatic Tissue Processor
- Argon Ion Milling System

Focused Ion Beam (FIB)
Single Beam System

Contact & Support
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SMI3000 Series

High Performance FIB System

The Focused Ion Beam (FIB) System achieves the world�s smallest beam diameter of 4nm. It consists of a high-performance FIB optical system, high-vacuum sample chamber, auxiliary chamber, specimen stage compatible with 50mm samples, vacuum evacuation system, and computer system. The scanning ion microscope function, sputter etching function with ion beam irradiation, and deposition function by squirting source gas and ion beam irradiation enables minute scale cross-section processing and observation of selected areas on a 50mm sample.

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Features

The standard-accessory sample holder allows samples of various shapes handled in research fields to be adapted to the FIB system.
Optional auto-pilot software enables high-precision and high-throughput TEM sample fabrication.
Contact with the sample surface on the ar ea irradiated by the ion beam becomes possible by attaching the optional micro probing system. This micro-probing system can be inclined together with the specimen stage. By inclining the micro-probing system with the probe in contact with the sample surface enables ion beam irradiation from different angles resulting in highly flexible operation.
The auxiliary chamber (standard-accessory) allows a sample to be loaded on the system without exposing the sample chamber to air.
A high concentration gas atmosphere can be created around the ion beam irradiated area by attaching a second gas injector to the system. This is necessary for three-dimensional nanostructure fabrication by carbon deposition. The second gas injector has a retractable structure so not to compromise the basic functions of the SMI3050. Incorporating three-dimensional data created by the 3D-CAD system enables fabrication of complex forms.

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